old news "repackaged"
Intel 14nm ramp...
By semi_equip_junkie . Jun 19, 2012 5:23 PM . Permalink
Where are the analysts?
Waiting for Gaudot?
Intel plans to move double patterning at 14nm into production in 2013 and also expects to initiate an EUV pilot line (initially using Intel 3100 tool) at the same time. At 10nm, Intel likely will use complimentary patterning (i.e. mix and match of EUV and QP/ArF immersion techniques). With Intel moving to high-volume 14nm production in 2013 and critical layers using ArF Dry and immersion tools set to double from 23 to 46, Barclays anticipates a meaningful step up in wafer-fab equipment (WFE) spend from Intel in 2013, particularly for litho – look for order pickup late 2012.