Entegris 10nm liquid filter helps semi makers ramp next technology node

theflyonthewall.com

Entegris will feature the 10 nanometer-rated Intercept® HPM liquid filter, its latest generation of advanced filtration solutions for very demanding advanced semiconductor manufacturing, at the SEMICON Taiwan tradeshow being held in Taipei, Taiwan, on September 5 - 7, 2012. This new version of the Intercept HPM family of filters is designed to remove particles and other contaminants from dilute liquid chemistries and solutions used in the wet etch and clean process at leading edge semiconductor fabs. The new filter uses surface modified, asymmetric UPE (ultra-high molecular weight polyethylene) membrane which is hydrophilic to provide the highest level of cleanliness and particle retention while maintaining high process flows.

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