PLL Expands into Research

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Pall Corporation (PLL) has entered into research collaboration with Lewis University for the second year in succession. In continuance with Pall’s agreement with the university, last year (announced by the company on November 02, 2011) the scientists from both the bodies have decided to broaden the scope of manufacturing microchips, based on the previous joint research conducted by the two organizations.

This research project forms a part of Pall’s Microelectronics segment, which has expertise in innovative detection, filtration and purification products for chemical, gas, water etc. and specially in the Chemical mechanical polishing (CMP) technology. Recently a research paper on the Pall/Lewis University research, entitled “The Role of Abrasive Type and Media Surface Energy on Nanoparticle Absorption,” was presented at the International Conference on Planarization/CMP Technology (ICPT) in Grenoble, France, by Pall’s senior VP (Marketing) of the Microelectronics segment.

After the company’s earlier approach to the agreement in November 2011, it was found that significant disparity occurs between particles and filter media interplay under conditions that simulate actual abrasive particles or their agglomerates in a depth filter. So this time the study was drafted to illustrate the differences in absorption characteristics of silica and ceria particles, which are common abrasives in CMP slurry, to filter media.

Last quarter PLL missed the Zacks Earnings Estimates by 2.37%, while Tetra Tech Inc. (TTEK) and Haemonetics Corp. (HAE) performed better. In such a scenario, in the absence of general business expansion, exceptional gains are likely to be made only by supplying new products or processes. These in turn are likely to emerge from research laboratories. Therefore, this research collaboration was enthusiastically pursued by Pall considering the possession of research facilities as one of the primary factors for industrial progress. Hence, this step is expected to attract sound investments, thereby ensuring robust growth, if not in the short term, surely in the longer term.

Pall currently has a Zacks Rank # 3 (Hold).
 

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