PLAINVIEW, N.Y.--(BUSINESS WIRE)--
Veeco Instruments Inc. (VECO) announced today that its GENxplor™ R&D Molecular Beam Epitaxy (MBE) System won the Compound Semiconductor (CS) Industry Award for the biggest breakthrough in compound semiconductor manufacturing over the last 12 months.
“The CS Industry Awards recognize companies that have won the approval of their peers,” said Richard Stevenson, Editor, Compound Semiconductor Magazine. “I believe that many readers voted for the GENxplor because they understand that university researchers are looking for a tool that is robust, relatively small, and capable of allowing them to carry out their research as quickly and successfully as possible."
The GENxplor is a fully integrated deposition system that creates high quality epitaxial layers on substrates up to 3” in diameter and is ideal for cutting edge research on a wide variety of materials including GaAs, nitrides, and oxides. Its efficient single frame design makes it up to 40% smaller than other MBE systems, saving valuable lab space and reducing installation time. The open architecture design of the GENxplor also improves ease-of-use, provides convenient access to effusion cells, and easier serviceability when compared to other MBE systems.
This is the second time in three years that Veeco has won this award. The TurboDisc® MaxBright® Multi-Reactor Metal Organic Chemical Vapor Deposition (MOCVD) System was awarded the Compound Semiconductor Manufacturing Award in 2012 for being the biggest breakthrough in compound semiconductor equipment.
“We are honored to receive the CS Manufacturing Award for the GENxplor, the first MBE system to be recognized in the compound semiconductor category,” commented Jim Northup, Vice President, General Manager for Veeco’s MBE Operations. “Since its introduction in 2013, the GENxplor has quickly become the R&D system of choice for leading research universities and institutions.”
About GENxplor R&D MBE System
Veeco's GENxplor features an efficient single frame design that combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other MBE systems, saving valuable lab space. Because the manual system is integrated on a single frame, installation time is reduced. The open architecture design of the GENxplor also improves ease-of-use, provides convenient access to effusion cells, and allows easier serviceability when compared to other MBE systems. When coupled with Veeco’s recently introduced retractable sources, the GENxplor system represents the state-of-the-art in oxide materials research.
Veeco’s process equipment solutions enable the manufacture of LEDs, flexible OLEDs, power electronics, hard drives, MEMS and wireless chips. We are the market leader in LED, MBE, Ion Beam and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit www.veeco.com.
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2013 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
- Compound Semiconductor