ASML reaches 'first light' milestone on first High NA EUV tool
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AMSTERDAM, Feb 28 (Reuters) - ASML has reached "first light" on its massive new High NA EUV lithography system, the Dutch semiconductor equipment maker confirmed on Wednesday, a milestone that means the tool is functioning though not at full performance.
The head of technology development at Intel, Ann Kelleher, first mentioned the progress during a talk at the SPIE lithography conference on Tuesday in San Jose.
ASML confirmed Kelleher's remarks were accurate. (Reporting by Toby Sterling; editing by Jason Neely)
